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ASML

Companies/Netherlands  •  Curated by Admin Timeline.sg

ASML (Advanced Semiconductor Materials Lithography) is a Dutch company founded in 1984 that became the world's leading supplier of photolithography systems for the semiconductor industry. The timeline traces its journey from a joint venture to a market-dominating firm, covering key technological breakthroughs like TWINSCAN and EUV lithography, strategic acquisitions, and financial milestones.

Chronological Storyline (32 Milestones)

1984 CE

ASML Founded

ASML is founded as a joint venture between ASM International and Philips to develop lithography equipment for semiconductor manufacturing. The company starts with 31 employees and a focus on stepper technology. #business #technology

ASML Founded
ASML Founded
By A ansems - Own work, Public domain, https://commons.wikimedia.org/w/index.php?curid=4092531
1985 CE

First Product: PAS 2000

ASML ships its first lithography system, the PAS 2000, a contact printer. It marks the company's entry into the semiconductor equipment market. #technology #manufacturing

1986 CE

PAS 2500 Stepper Introduced

ASML introduces the PAS 2500, its first stepper lithography system, improving resolution and throughput. This product helps ASML gain initial customers like Philips and IBM. #technology #innovation

1988 CE

PAS 5000 Series Launched

The PAS 5000 series stepper is introduced, offering enhanced overlay accuracy and productivity. It becomes a key product for ASML’s growth in the late 1980s. #technology #semiconductors

1991 CE

Initial Public Offering

ASML goes public on the Amsterdam Stock Exchange and NASDAQ, raising capital to expand R&D and production. The IPO values the company at several hundred million guilders. #finance #business

1995 CE

PAS 5500 Launched

ASML unveils the PAS 5500 platform, a breakthrough in step-and-scan lithography. It becomes the industry standard for critical layers and propels ASML to market leadership in the late 1990s. #technology #innovation

1997 CE

Doug Dunn Appointed CEO

Doug Dunn becomes CEO of ASML, succeeding Gjalt Smit. Dunn leads the company through a period of rapid growth and technological transition. #leadership #business

2000 CE

Acquisition of SVG

ASML acquires Silicon Valley Group (SVG) for $1.6 billion, gaining access to SVG's micro-lithography technology and US customer base. This is ASML's largest acquisition at the time. #mergers #acquisitions

2001 CE

First TWINSCAN System Delivered

ASML ships its first TWINSCAN lithography system to TSMC, introducing dual-stage technology that improves overlay accuracy and wafer handling. This becomes a cornerstone of ASML’s product line. #technology #innovation

2002 CE

First 193nm Lithography System

ASML introduces its first 193nm wavelength lithography system, enabling smaller feature sizes for advanced semiconductor nodes. #technology #semiconductors

2003 CE

1000th System Shipped

ASML delivers its 1000th lithography system, marking a major production milestone. The company continues to expand its global install base. #manufacturing #milestone

2004 CE

First Immersion Lithography Prototype

ASML demonstrates its first immersion lithography prototype, using a liquid layer between the lens and wafer to improve resolution. This technology extends optical lithography to 45nm and below. #technology #innovation

2005 CE

XT:1400i Immersion System Introduced

ASML launches the XT:1400i, its first production immersion lithography system, using 193nm immersion technology. It is adopted by leading chipmakers for 65nm and 45nm nodes. #technology #semiconductors

2006 CE

First Customer Shipment of Immersion System

ASML ships its first commercial immersion lithography system to a customer, enabling double patterning and advanced node production. #manufacturing #technology

2007 CE

Acquisition of Brion Technologies

ASML acquires Brion Technologies, a computational lithography software company. This strengthens ASML’s holistic lithography approach, combining hardware and software. #mergers #acquisitions

2008 CE

Eric Meurice Appointed CEO

Eric Meurice becomes CEO of ASML, succeeding Jim Powell. Meurice oversees the company’s recovery from the 2008 financial crisis and the development of EUV lithography. #leadership #business

2010 CE

First Pre-Production EUV System Shipped

ASML ships its first pre-production EUV lithography system (NXE:3100) to research institutes, marking a crucial step toward commercializing extreme ultraviolet (EUV) technology. #technology #EUV

2012 CE

Acquisition of Cymer

ASML acquires Cymer, a leading manufacturer of light sources for lithography, for approximately $2.6 billion. The deal secures ASML’s EUV light source technology and reduces supply chain risk. #mergers #acquisitions

2013 CE

NXE:3300B EUV System Introduced

ASML introduces the NXE:3300B, the first EUV lithography system designed for high-volume manufacturing. It uses 13.5nm wavelength to enable extreme miniaturization. #technology #EUV

2014 CE

Peter Wennink Appointed CEO

Peter Wennink becomes CEO of ASML, succeeding Eric Meurice. Under Wennink, ASML leads the transition to EUV lithography and achieves record revenues. #leadership #business

2015 CE

Investment in Zeiss

ASML invests €1 billion in Zeiss, a key supplier of optical systems, to secure access to advanced optics for EUV lithography. This cements a strategic partnership. #partnership #technology

2016 CE

500th Immersion System Shipped

ASML delivers its 500th immersion lithography system, demonstrating the widespread adoption of immersion technology for advanced semiconductor nodes. #manufacturing #milestone

2017 CE

Acquisition of Hermes Microvision

ASML acquires Hermes Microvision, a Taiwanese e-beam inspection company, for $180 million. This adds mask inspection capabilities to ASML’s portfolio. #mergers #acquisitions

2018 CE

NXE:3400B EUV System Shipped

ASML ships the NXE:3400B, an improved EUV system with higher throughput (170 wafers per hour). It is adopted by Samsung, TSMC, and Intel for 7nm and 5nm production. #technology #EUV

2019 CE

High-NA EUV Development Announced

ASML announces the High-NA EUV platform (TWINSCAN EXE:5000) with a numerical aperture of 0.55, promising further miniaturization beyond 3nm. The first systems are targeted for 2023. #technology #innovation

2020 CE

35 EUV Systems Shipped

ASML ships 35 EUV lithography systems in the fiscal year, reflecting growing demand for EUV in high-volume manufacturing. Revenue reaches €14 billion. #manufacturing #EUV

2021 CE

42 EUV Systems Shipped

ASML ships 42 EUV systems, a record number, as chipmakers ramp up production of 5nm and 7nm nodes. The company’s market cap surpasses $300 billion. #finance #technology

2022 CE

Export Controls Impact China Sales

The US government imposes export restrictions on advanced chipmaking tools to China, affecting ASML’s ability to sell its latest EUV and DUV systems to Chinese customers. #regulation #trade

2023 CE

First High-NA EUV System Shipped

ASML ships the first High-NA EUV system (EXE:5000) to Intel, marking a new era in lithography for sub-3nm nodes. The system allows resolution below 8nm. #technology #EUV

2024 CE

Christophe Fouquet Appointed CEO

Christophe Fouquet becomes CEO, succeeding Peter Wennink. Fouquet, formerly CTO, leads ASML into the High-NA EUV era and addresses geopolitical challenges. #leadership #business

2024 CE

Record Revenue of €28 Billion

ASML reports record annual revenue of €28 billion, driven by strong demand for EUV and DUV systems. The company remains the most valuable tech firm in Europe. #finance #business

2025 CE

High-NA EUV Ramp-Up Begins

ASML begins volume production of High-NA EUV systems, with multiple shipments to major chipmakers for 2nm and below nodes. This secures ASML's dominance in next-generation lithography. #technology #EUV